The defect source identifier displays the data collected from the wafer defect inspection process and the scanning electron microscope process 206 in the defects table 406 of the defect summary screen. All defects are assigned an on-the-fly class from wafer defect inspection process. Selected defects may be analyzed further using an optical microscope and be provided a revisit class. A subset of these defects can be analyzed even further using the scanning electron microscope process 206 and be given a scanning electron microscope-automated defect classification class. Thus, a single defect may be assigned various defect classifications depending upon the metrology tools used to inspect the defect. At the end of inspection, a single KLA result file is generated by each metrology tool used to inspect the defect along with image files for each defect. For the scanning electron microscope process 206, the KLA result file is produced per wafer. For the wafer defect inspection process, the KLA result file is produced per lot. If the revisit process is performed on a wafer, only one wafer defect inspection process KLA file is produced showing the combined information for the on-the-fly and revisit classifications.
The wafer defect inspection process and the scanning electron microscope process 206 export their KLA result files and image files to a directory that is located locally to the process and/or 206 i.e., either in the tool's computer or in the client computer. These export directories are available to the defect source identifier as Network File System mountable file systems as described above.
The KLA file typically is configured to contain many records. One embodiment of the records used by the KLA file of the defect source identifier can be arranged as follows:
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